Advanced deposition system for low damage thin films.

• Unité de recherche: INNOSUISSE
• Numéro de projet: 18940.2 PFNM-NM
• Titre du projet anglais: Advanced deposition system for low damage thin films.

Description succincte (Allemand)

Advanced deposition system for low damage thin films.

Description succincte (Anglais)

Advanced deposition system for low damage thin films.

Résumé des résultats (Abstract) (Allemand)

Magnetron sputtering using facing target cathodes could greatly increase target utilization, compatibility with magnetic targets, and low-energy, low-ion damage deposition. We will demonstrate this innovation potential with magnetic film systems of high flatness, uniformity, and likely also epitaxy and monolayer thickness control. Industrial production methods with these features are key to succeeding in the sensor market, and the future market in spintronics technology.

Résumé des résultats (Abstract) (Anglais)

Magnetron sputtering using facing target cathodes could greatly increase target utilization, compatibility with magnetic targets, and low-energy, low-ion damage deposition. We will demonstrate this innovation potential with magnetic film systems of high flatness, uniformity, and likely also epitaxy and monolayer thickness control. Industrial production methods with these features are key to succeeding in the sensor market, and the future market in spintronics technology.