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Research unit
INNOSUISSE
Project number
19193.1 PFNM-NM
Project title
Feasibility Study of COSAMI, a Compact EUV Source for Actinic Mask Inspection

Texts for this project

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Short description
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Abstract
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Inserted texts


CategoryText
Short description
(German)
Feasibility study : Machbarkeitsstudie für eine kompakte EUV-Quelle für eine aktinische Maskeninspektionseinrichtung (COSAMI)
Short description
(English)
Feasibility Study of COSAMI, a Compact EUV Source for Actinic Mask Inspection
Abstract
(German)
Extreme ultraviolet (EUV) lithography is the fabrication technology for the next generation of microelectronics. The objective of the present proposal is a feasibility study for a compact light source based on accelerator technology for EUV metrology. As novelties, the compact source is equipped with top-up injection and an undulator with small period length and low gap. The 3-D arrangement of the accelerators minimizes the footprint of the facility.
Abstract
(English)
Extreme ultraviolet (EUV) lithography is the fabrication technology for the next generation of microelectronics. The objective of the present proposal is a feasibility study for a compact light source based on accelerator technology for EUV metrology. As novelties, the compact source is equipped with top-up injection and an undulator with small period length and low gap. The 3-D arrangement of the accelerators minimizes the footprint of the facility.