Multilayer ALD films for capacitance diaphragm gauge sealing against halogen and oxygen industrial plasmas

• Unité de recherche: INNOSUISSE
• Numéro de projet: 17613.2 PFNM-NM
• Titre du projet anglais: Multilayer ALD films for capacitance diaphragm gauge sealing against halogen and oxygen industrial plasmas

Description succincte (Allemand)

Multilayer ALD films for capacitance diaphragm gauge sealing against halogen and oxygen industrial plasmas

Description succincte (Anglais)

Multilayer ALD films for capacitance diaphragm gauge sealing against halogen and oxygen industrial plasmas

Résumé des résultats (Abstract) (Allemand)

An innovative multilayer thin film material will be developed for pressure sensor heads of plasma etch tools used in semiconductor industry. Atomic layer deposition will be employed as an enabling method for conformal coating and sealing the interior sensor head against the harsh industrial plasma environments. Systematic plasma etch studies & characterization together with simulations of plasma flow and mechanical constraints will be used to design the multilayer material.

Résumé des résultats (Abstract) (Anglais)