Multilayer ALD films for capacitance diaphragm gauge sealing against halogen and oxygen industrial plasmas - Texts

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Research unit

INNOSUISSE

Project number

17613.2 PFNM-NM

Project title

Multilayer ALD films for capacitance diaphragm gauge sealing against halogen and oxygen industrial plasmas

Texts for this project

	German	French	Italian	English
Short description		-	-
Abstract		-	-

Inserted texts

Category	Text
Short description (German)	Multilayer ALD films for capacitance diaphragm gauge sealing against halogen and oxygen industrial plasmas
Short description (English)	Multilayer ALD films for capacitance diaphragm gauge sealing against halogen and oxygen industrial plasmas
Abstract (German)	An innovative multilayer thin film material will be developed for pressure sensor heads of plasma etch tools used in semiconductor industry. Atomic layer deposition will be employed as an enabling method for conformal coating and sealing the interior sensor head against the harsh industrial plasma environments. Systematic plasma etch studies & characterization together with simulations of plasma flow and mechanical constraints will be used to design the multilayer material.
Abstract (English)