Development of a Novel High-Resolution Photolithography 6' System for Efficient LEDs and Other Photonic Devices

• Unité de recherche: INNOSUISSE
• Numéro de projet: 13498.1;5 PFFLM-NM
• Titre du projet anglais: Development of a Novel High-Resolution Photolithography 6' System for Efficient LEDs and Other Photonic Devices

Description succincte (Allemand)

Development of a Novel High-Resolution Photolithography 6' System for Efficient LEDs and Other Photonic Devices

Description succincte (Anglais)

Development of a Novel High-Resolution Photolithography 6' System for Efficient LEDs and Other Photonic Devices

Résumé des résultats (Abstract) (Allemand)

In this project we aim to develop a high intensity, highly collimated and very uniform 6-inch illumination system together with a very precise movable stage for a lithography tool to generate periodic nano pattern at low cost. Such a lithography tool can be used in high volume production of LEDs and other devices.

Résumé des résultats (Abstract) (Anglais)

In this project we aim to develop a high intensity, highly collimated and very uniform 6-inch illumination system together with a very precise movable stage for a lithography tool to generate periodic nano pattern at low cost. Such a lithography tool can be used in high volume production of LEDs and other devices.