Development of a Novel High-Resolution Photolithography 6' System for Efficient LEDs and Other Photonic Devices

• Research unit: INNOSUISSE
• Project number: 13498.1;5 PFFLM-NM

Short description (German)

Development of a Novel High-Resolution Photolithography 6' System for Efficient LEDs and Other Photonic Devices

Short description (English)

Development of a Novel High-Resolution Photolithography 6' System for Efficient LEDs and Other Photonic Devices

Abstract (German)

In this project we aim to develop a high intensity, highly collimated and very uniform 6-inch illumination system together with a very precise movable stage for a lithography tool to generate periodic nano pattern at low cost. Such a lithography tool can be used in high volume production of LEDs and other devices.

Abstract (English)

In this project we aim to develop a high intensity, highly collimated and very uniform 6-inch illumination system together with a very precise movable stage for a lithography tool to generate periodic nano pattern at low cost. Such a lithography tool can be used in high volume production of LEDs and other devices.