Development of a Novel High-Resolution Photolithography 6' System for Efficient LEDs and Other Photonic Devices

Forschungsstelle

INNOSUISSE

Projektnummer

13498.1;5 PFFLM-NM

Projekttitel

Development of a Novel High-Resolution Photolithography 6' System for Efficient LEDs and Other Photonic Devices

Projekttitel Englisch

Development of a Novel High-Resolution Photolithography 6' System for Efficient LEDs and Other Photonic Devices

Texte zu diesem Projekt

	Deutsch	Französisch	Italienisch	Englisch
Kurzbeschreibung		-	-
Abstract		-	-

Kategorie	Text
Kurzbeschreibung (Deutsch)	Development of a Novel High-Resolution Photolithography 6' System for Efficient LEDs and Other Photonic Devices
Kurzbeschreibung (Englisch)	Development of a Novel High-Resolution Photolithography 6' System for Efficient LEDs and Other Photonic Devices
Abstract (Deutsch)	In this project we aim to develop a high intensity, highly collimated and very uniform 6-inch illumination system together with a very precise movable stage for a lithography tool to generate periodic nano pattern at low cost. Such a lithography tool can be used in high volume production of LEDs and other devices.
Abstract (Englisch)	In this project we aim to develop a high intensity, highly collimated and very uniform 6-inch illumination system together with a very precise movable stage for a lithography tool to generate periodic nano pattern at low cost. Such a lithography tool can be used in high volume production of LEDs and other devices.