Development of maskless Ion Beam LIGA technology for 3D, deep and high aspect ratio micro(nano) structuring of photoresist materials

Research unit

INNOSUISSE

Project number

6617.1;5 FHS-IW

Project title

Development of maskless Ion Beam LIGA technology for 3D, deep and high aspect ratio micro(nano) structuring of photoresist materials

Texts for this project

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Category	Text
Short description (French)	Development of maskless Ion Beam LIGA technology for 3D, deep and high aspect ratio micro(nano) structuring of photoresist materials