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Research unit
INNOSUISSE
Project number
11548.2;7 PFIW-IW
Project title
Development of industrial gas-metal plasma sources for the deposition of nanostructured GaN semiconductor layers for lighting applications
Project status Finished
 
Start date 01.10.2010
End date 10.11.2015
 
Granted total costs 608'760.00  CHF
Section 23 Förderbereich Engineering
Project category Project
Research type Applied research and development
NABS classification Non divisible / inclassable research
 
Research disciplines
100 % T130 Production technology
Last modification of the project
27.11.2014