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Research unit
INNOSUISSE
Project number
9675.2;5 PFIW-IW
Project title
A new low ion energy bombardment PECVD reactor for the deposition of thin film silicon for solar cell applications
Project status Finished
 
Start date 01.01.2009
End date 14.08.2012
 
Granted total costs 412'672.00  CHF
Section 23 Förderbereich Engineering
Project category Project
Research type Applied research and development
NABS classification Non divisible / inclassable research
 
Research disciplines
100 % T210 Mechanical engineering,hydraulics,vacuum techn.,vibration and acoustic eng.
Last modification of the project
27.11.2014