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Research unit
INNOSUISSE
Project number
5602.1;7 KTS-IW
Project title
New high density plasma source for etching and plasma enhanced chemical vapor deposition (PECVD)

Participants

Research organisation: Innosuisse
Swiss Innovation Agency
Einsteinstrasse 2
CH-3003 Bern
+41 58 461 61 61 (Call Center)
info@innosuisse.ch
www.innosuisse.ch/
Contact person

 Dr.
Christoph Hollenstein
EPFL
Station 13
CH-1015 Lausanne
021 693 34 71
christophe.hollenstein@epfl.ch