Ion Beam Sputtering of 2D materials # A new approach

• Unité de recherche: INNOSUISSE
• Numéro de projet: 47744.1 IP-ENG
• Titre du projet anglais: Ion Beam Sputtering of 2D materials # A new approach

Description succincte (Allemand)

Ion Beam Sputtering of 2D materials # A new approach

Description succincte (Anglais)

Ion Beam Sputtering of 2D materials # A new approach

Résumé des résultats (Abstract) (Allemand)

Goal of the project is to design, build and utilize a new ion beam sputtering tool for the synthesis of 2D materials such as graphene and transition metal dichalcogenides. The potential of the new developed technology and processes for a number of innovative applications will be demonstrated.