Ion Beam Sputtering of 2D materials # A new approach

Research unit

INNOSUISSE

Project number

47744.1 IP-ENG

Project title

Ion Beam Sputtering of 2D materials # A new approach

Texts for this project

	German	French	Italian	English
Short description		-	-
Abstract		-	-	-

Category	Text
Short description (German)	Ion Beam Sputtering of 2D materials # A new approach
Short description (English)	Ion Beam Sputtering of 2D materials # A new approach
Abstract (German)	Goal of the project is to design, build and utilize a new ion beam sputtering tool for the synthesis of 2D materials such as graphene and transition metal dichalcogenides. The potential of the new developed technology and processes for a number of innovative applications will be demonstrated.