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Unité de recherche
INNOSUISSE
Numéro de projet
17503.1 PFNM-NM
Titre du projet
3D Nano2Micro: enhancing the 3D fabrication range of the NanoFrazor
Titre du projet anglais
3D Nano2Micro: enhancing the 3D fabrication range of the NanoFrazor MIP: SwissLitho AG

Textes relatifs à ce projet

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Description succincte
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Résumé des résultats (Abstract)
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Textes saisis


CatégorieTexte
Description succincte
(Allemand)
3D Nano2Micro: enhancing the 3D fabrication range of the NanoFrazor
Description succincte
(Anglais)
3D Nano2Micro: enhancing the 3D fabrication range of the NanoFrazor MIP: SwissLitho AG
Résumé des résultats (Abstract)
(Allemand)
Thermal scanning probe lithography is used for the fabrication of complex 3D nanostructures. So far, it is limited by the selection of processable materials. This project aims to develop a nanofabrication process to transfer the 3D resist nanostructures into silicon. Such a process increases the technological possibilities of the core product of SwissLitho tremendously. It would make the fabrication of silicon 3D nanostructures straightforward and therefore boost the sales of SwissLitho.
Résumé des résultats (Abstract)
(Anglais)
Thermal scanning probe lithography is used for the fabrication of complex 3D nanostructures. So far, it is limited by the selection of processable materials. This project aims to develop a nanofabrication process to transfer the 3D resist nanostructures into silicon. Such a process increases the technological possibilities of the core product of SwissLitho tremendously. It would make the fabrication of silicon 3D nanostructures straightforward and therefore boost the sales of SwissLitho.