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Forschungsstelle
INNOSUISSE
Projektnummer
17503.1 PFNM-NM
Projekttitel
3D Nano2Micro: enhancing the 3D fabrication range of the NanoFrazor MIP: SwissLitho AG
Projekttitel Englisch
3D Nano2Micro: enhancing the 3D fabrication range of the NanoFrazor MIP: SwissLitho AG

Texte zu diesem Projekt

 DeutschFranzösischItalienischEnglisch
Kurzbeschreibung
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Abstract
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Erfasste Texte


KategorieText
Kurzbeschreibung
(Deutsch)
3D Nano2Micro: enhancing the 3D fabrication range of the NanoFrazor
Kurzbeschreibung
(Englisch)
3D Nano2Micro: enhancing the 3D fabrication range of the NanoFrazor MIP: SwissLitho AG
Abstract
(Deutsch)
Thermal scanning probe lithography is used for the fabrication of complex 3D nanostructures. So far, it is limited by the selection of processable materials. This project aims to develop a nanofabrication process to transfer the 3D resist nanostructures into silicon. Such a process increases the technological possibilities of the core product of SwissLitho tremendously. It would make the fabrication of silicon 3D nanostructures straightforward and therefore boost the sales of SwissLitho.
Abstract
(Englisch)
Thermal scanning probe lithography is used for the fabrication of complex 3D nanostructures. So far, it is limited by the selection of processable materials. This project aims to develop a nanofabrication process to transfer the 3D resist nanostructures into silicon. Such a process increases the technological possibilities of the core product of SwissLitho tremendously. It would make the fabrication of silicon 3D nanostructures straightforward and therefore boost the sales of SwissLitho.