A new low ion energy bombardment PECVD reactor for the deposition of thin film silicon for solar cell applications

• Unité de recherche: INNOSUISSE
• Numéro de projet: 13271.1;8 PFIW-IW
• Titre du projet anglais: A new low ion energy bombardment PECVD reactor for the deposition of thin film silicon for solar cell applications

Description succincte (Anglais)

A new low ion energy bombardment PECVD reactor for the deposition of thin film silicon for solar cell applications

Description succincte (Français)

A new low ion energy bombardment PECVD reactor for the deposition of thin film silicon for solar cell applications

Résumé des résultats (Abstract) (Anglais)

A novel plasma reactor is proposed which is capable of depositing thin film micro-crystalline silicon material in new conditions of low ion energy bombardment. The two particular characteristics of the proposed reactor are low pressure operation and the absence of high ion energy bombardment. To achieve this, the plasma is separated from the substrate using structured electrodes especially designed to facilitate ignition at low gas pressure. Thin film silicon is the basis of photovoltaic solar cells and different new properties, which are difficult to obtain in conventional reactors, are necessary to improve solar cell efficiency and stability. The laboratory reactor design, after optimization for plasma and film properties, will be developed into a pilot industrial reactor.

Résumé des résultats (Abstract) (Français)

A novel plasma reactor is proposed which is capable of depositing thin film micro-crystalline silicon material in new conditions of low ion energy bombardment. The two particular characteristics of the proposed reactor are low pressure operation and the absence of high ion energy bombardment. To achieve this, the plasma is separated from the substrate using structured electrodes especially designed to facilitate ignition at low gas pressure. Thin film silicon is the basis of photovoltaic solar cells and different new properties, which are difficult to obtain in conventional reactors, are necessary to improve solar cell efficiency and stability. The laboratory reactor design, after optimization for plasma and film properties, will be developed into a pilot industrial reactor.