Advanced Mask Aligner Lithography (AMALITH)

• Unité de recherche: INNOSUISSE
• Numéro de projet: 13254.1;6 PFFLM-NM
• Titre du projet anglais: Advanced Mask Aligner Lithography (AMALITH)

Description succincte (Anglais)

Advanced Mask Aligner Lithography (AMALITH)

Description succincte (Français)

Advanced Mask Aligner Lithography (AMALITH)

Résumé des résultats (Abstract) (Anglais)

Advanced Mask Aligner Lithography (AMALITH) is a novel lithography technique based on the MicroOptic Exposure Optics (MOEO) developed and sold by SUSS MicroOptics. Despite its potential to make micro- and nanostructures, as required for LEDs, cell-membranes, bio-sensors, market penetration remains low. The goals of the project are (A) Develop AMALITH prototypes for existing markets and increase the sales of MOEO - main market objective and ( B) Find new applications and markets for AMALITH and MOEO - emerging market objective.

Résumé des résultats (Abstract) (Français)

Advanced Mask Aligner Lithography (AMALITH) is a novel lithography technique based on the MicroOptic Exposure Optics (MOEO) developed and sold by SUSS MicroOptics. Despite its potential to make micro- and nanostructures, as required for LEDs, cell-membranes, bio-sensors, market penetration remains low. The goals of the project are (A) Develop AMALITH prototypes for existing markets and increase the sales of MOEO - main market objective and ( B) Find new applications and markets for AMALITH and MOEO - emerging market objective.