Advanced Mask Aligner Lithography (AMALITH)

• Research unit: INNOSUISSE
• Project number: 13254.1;6 PFFLM-NM

Short description (English)

Advanced Mask Aligner Lithography (AMALITH)

Short description (French)

Advanced Mask Aligner Lithography (AMALITH)

Abstract (English)

Advanced Mask Aligner Lithography (AMALITH) is a novel lithography technique based on the MicroOptic Exposure Optics (MOEO) developed and sold by SUSS MicroOptics. Despite its potential to make micro- and nanostructures, as required for LEDs, cell-membranes, bio-sensors, market penetration remains low. The goals of the project are (A) Develop AMALITH prototypes for existing markets and increase the sales of MOEO - main market objective and ( B) Find new applications and markets for AMALITH and MOEO - emerging market objective.

Abstract (French)

Advanced Mask Aligner Lithography (AMALITH) is a novel lithography technique based on the MicroOptic Exposure Optics (MOEO) developed and sold by SUSS MicroOptics. Despite its potential to make micro- and nanostructures, as required for LEDs, cell-membranes, bio-sensors, market penetration remains low. The goals of the project are (A) Develop AMALITH prototypes for existing markets and increase the sales of MOEO - main market objective and ( B) Find new applications and markets for AMALITH and MOEO - emerging market objective.