Very fast SiOx barrier deposition on polymers by plasma enhanced chemical vapor (PECVD) process with a helicon plasma source

• Unité de recherche: INNOSUISSE
• Numéro de projet: 9896.2;4 PFIW-IW
• Titre du projet anglais: Very fast SiOx barrier deposition on polymers by plasma enhanced chemical vapor (PECVD) process with a helicon plasma source

Description succincte (Anglais)

Very fast SiOx barrier deposition on polymers by plasma enhanced chemical vapor (PECVD) process with a helicon plasma source

Description succincte (Français)

Very fast SiOx barrier deposition on polymers by plasma enhanced chemical vapor (PECVD) process with a helicon plasma source

Résumé des résultats (Abstract) (Anglais)

The use of plasma deposition on polymer films for the formation of barrier layers was shown to be very efficient in terms of the quality of coating. But until now, this technique suffers from its relatively low deposition rate compared to the rate of the electron beam reactive evaporation technique. The goal of this project is to adapt and to test a novel RF Helicon plasma source developed by Helyssen S.a.r.l. which has shown, on preliminary experiments, to generate very high deposition rates of barrier functional coatings. A large part of the physical concepts and capabilities of this source is still only theoretical and has to be concretized by basic experiments at the CRPP. On the basis of this research, a semi-industrial version of a RF planar source will be implemented on a roll-to-roll equipment located at Tetra Pak.

Résumé des résultats (Abstract) (Français)

The use of plasma deposition on polymer films for the formation of barrier layers was shown to be very efficient in terms of the quality of coating. But until now, this technique suffers from its relatively low deposition rate compared to the rate of the electron beam reactive evaporation technique. The goal of this project is to adapt and to test a novel RF Helicon plasma source developed by Helyssen S.a.r.l. which has shown, on preliminary experiments, to generate very high deposition rates of barrier functional coatings. A large part of the physical concepts and capabilities of this source is still only theoretical and has to be concretized by basic experiments at the CRPP. On the basis of this research, a semi-industrial version of a RF planar source will be implemented on a roll-to-roll equipment located at Tetra Pak.