High speed scanning interferometer for 5nm precision gap control on multilayered substrates

• Unité de recherche: INNOSUISSE
• Numéro de projet: 7809.2;6 NMPP-NM
• Titre du projet anglais: High speed scanning interferometer for 5nm precision gap control on multilayered substrates

Description succincte (Allemand)

High speed scanning interferometer for 5nm precision gap control on multilayered substrates

Description succincte (Anglais)

High speed scanning interferometer for 5nm precision gap control on multilayered substrates

Résumé des résultats (Abstract) (Allemand)

Holographic Lithography is today the enabling technology for the production of high performance, i.e. submicron resolution and large field TFTs and Advanced Displays as complete Systems on glass substrates. Measurement and control of the gap between a hologram and the substrate is a key task during exposure, as it uniquely allows compensating surface height variations when scanning the hologram. For a further increase in substrate size the scanning speed has to increase at least to 200mmm/s and as a consequence the closed loop bandwidth of gap control has to be remarkably increased. Today bandwidth of the gap measurement interferometer is limiting controller performance. The goal of the project is to develop an interferometer, capable to measure the gap at a sampling rate above 3000Hz with a precision higher than 5 nm.

Résumé des résultats (Abstract) (Anglais)

Holographic Lithography is today the enabling technology for the production of high performance, i.e. submicron resolution and large field TFTs and Advanced Displays as complete Systems on glass substrates. Measurement and control of the gap between a hologram and the substrate is a key task during exposure, as it uniquely allows compensating surface height variations when scanning the hologram. For a further increase in substrate size the scanning speed has to increase at least to 200mmm/s and as a consequence the closed loop bandwidth of gap control has to be remarkably increased. Today bandwidth of the gap measurement interferometer is limiting controller performance. The goal of the project is to develop an interferometer, capable to measure the gap at a sampling rate above 3000Hz with a precision higher than 5 nm.