High aspect ratio, deep sub-micrometer patterning of polymers with high energy ion beams

Research unit

INNOSUISSE

Project number

4785.2;3 TNS-NM

Project title

High aspect ratio, deep sub-micrometer patterning of polymers with high energy ion beams

Texts for this project

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Short description (French)	High aspect ratio, deep sub-micrometer patterning of polymers with high energy ion beams