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Research unit
INNOSUISSE
Project number
9896.2;4 PFIW-IW
Project title
Very fast SiOx barrier deposition on polymers by plasma enhanced chemical vapor (PECVD) process with a helicon plasma source
Project status Finished
 
Start date 01.07.2009
End date 13.11.2012
 
Granted total costs 328'320.00  CHF
Section 23 Förderbereich Engineering
Project category Project
Research type Applied research and development
NABS classification Non divisible / inclassable research
 
Research disciplines
100 % T130 Production technology
Last modification of the project
27.11.2014