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Research unit
INNOSUISSE
Project number
5602.1;7 KTS-IW
Project title
New high density plasma source for etching and plasma enhanced chemical vapor deposition (PECVD)
Project status Finished
 
Start date 01.11.2001
End date 18.04.2005
 
Granted total costs 405'000.00  CHF
Section 5 CTI
Project category Project
Research type Applied research and development
NABS classification Industrial production and technology
 
Research disciplines
100 % T150 Material technology
Last modification of the project
27.11.2014