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Research unit
INNOSUISSE
Project number
13271.1;8 PFIW-IW
Project title
A new low ion energy bombardment PECVD reactor for the deposition of thin film silicon for solar cell applications

Participants

Research organisation: Innosuisse
Swiss Innovation Agency
Einsteinstrasse 2
CH-3003 Bern
+41 58 461 61 61 (Call Center)
info@innosuisse.ch
www.innosuisse.ch/
Contact person

 Dr.
Alan Howling
EPFL
Station 13
CH-1015 Lausanne
021 693 34 96
alan.howling@epfl.ch