Development of Resonant ICP Plasma source for Diamond Nucleation

• Unité de recherche: INNOSUISSE
• Numéro de projet: 126.066 IP-ENG
• Titre du projet anglais: Development of Resonant ICP Plasma source for Diamond Nucleation

Mots-clé (Anglais)

Engineering, Material sciences

Résumé des résultats (Abstract) (Anglais)

This project develops a scalable plasma source using RF resonant networks for diamond nucleation & growth on 200mm wafers. The goal of this EPFL&EVATEC collaboration is to achieve high plasma density and uniformity, advancing industrial applications in semiconductors and quantum technologies.