Development of Resonant ICP Plasma source for Diamond Nucleation

Research unit

INNOSUISSE

Project number

126.066 IP-ENG

Project title

Development of Resonant ICP Plasma source for Diamond Nucleation

Texts for this project

	German	French	Italian	English
Key words	-	-	-
Abstract	-	-	-

Category	Text
Key words (English)	Engineering, Material sciences
Abstract (English)	This project develops a scalable plasma source using RF resonant networks for diamond nucleation & growth on 200mm wafers. The goal of this EPFL&EVATEC collaboration is to achieve high plasma density and uniformity, advancing industrial applications in semiconductors and quantum technologies.