Pushing the Limits of the NanoFrazor Technology: From Processes and Materials to Upscaling

Research unit

INNOSUISSE

Project number

100.062 IP-ENG

Project title

Pushing the Limits of the NanoFrazor Technology: From Processes and Materials to Upscaling (Innolink: 100.062 IP-ENG)

Texts for this project

	German	French	Italian	English
Key words	-	-	-
Abstract	-	-	-

Category	Text
Key words (English)	Engineering, Advanced manufacturing
Abstract (English)	Thermal scanning probe lithography (tSPL) is becoming more important in the nanolithography community. To go to the next level, upscaling of the NanoFrazor technology and processes to larger areas, operating with inert environments, and increasing throughput via parallelization needs to be realized.