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Forschungsstelle
INNOSUISSE
Projektnummer
62122.1 IP-ENG
Projekttitel
Pushing the Limits of the NanoFrazor Technology: From Processes and Materials to Upscaling (Innolink: 100.062 IP-ENG)
Projekttitel Englisch
Pushing the Limits of the NanoFrazor Technology: From Processes and Materials to Upscaling (Innolink: 100.062 IP-ENG)

Texte zu diesem Projekt
 DeutschFranzösischItalienischEnglisch
Kurzbeschreibung
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Abstract
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Erfasste Texte


KategorieText
Kurzbeschreibung
(Deutsch)
Pushing the Limits of the NanoFrazor Technology: From Processes and Materials to Upscaling (Innolink: 100.062 IP-ENG)
Kurzbeschreibung
(Englisch)
Pushing the Limits of the NanoFrazor Technology: From Processes and Materials to Upscaling
Abstract
(Deutsch)
Thermal scanning probe lithography (tSPL) is becoming more important in the nanolithography community. To go to the next level, upscaling of the NanoFrazor technology and processes to larger areas, operating with inert environments, and increasing throughput via parallelization needs to be realized.