Pushing the Limits of the NanoFrazor Technology: From Processes and Materials to Upscaling (Innolink: 100.062 IP-ENG)

• Forschungsstelle: INNOSUISSE
• Projektnummer: 100.062 IP-ENG
• Projekttitel Englisch: Pushing the Limits of the NanoFrazor Technology: From Processes and Materials to Upscaling (Innolink: 100.062 IP-ENG)

Schlüsselwörter (Englisch)

Engineering, Advanced manufacturing

Abstract (Englisch)

Thermal scanning probe lithography (tSPL) is becoming more important in the nanolithography community. To go to the next level, upscaling of the NanoFrazor technology and processes to larger areas, operating with inert environments, and increasing throughput via parallelization needs to be realized.