Hycompact: A compact vertically stacked chamber for hybrid thin film processing

• Unité de recherche: INNOSUISSE
• Numéro de projet: 47997.1 IP-ENG
• Titre du projet anglais: Hycompact: A compact vertically stacked chamber for hybrid thin film processing

Description succincte (Allemand)

Hycompact: A compact vertically stacked chamber for hybrid thin film processing

Description succincte (Anglais)

Hycompact: A compact vertically stacked chamber for hybrid thin film processing

Résumé des résultats (Abstract) (Allemand)

We develop a new technology for combining ALD and PVD deposition processes in an innovative, standalone and compact cluster equipment. This will enable the deposition of hybrid thin film systems demonstrated on nano-multilayers with superior mechanical and thermal properties.