Hycompact: A compact vertically stacked chamber for hybrid thin film processing

Research unit

INNOSUISSE

Project number

47997.1 IP-ENG

Project title

Hycompact: A compact vertically stacked chamber for hybrid thin film processing

Texts for this project

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Short description		-	-
Abstract		-	-	-

Category	Text
Short description (German)	Hycompact: A compact vertically stacked chamber for hybrid thin film processing
Short description (English)	Hycompact: A compact vertically stacked chamber for hybrid thin film processing
Abstract (German)	We develop a new technology for combining ALD and PVD deposition processes in an innovative, standalone and compact cluster equipment. This will enable the deposition of hybrid thin film systems demonstrated on nano-multilayers with superior mechanical and thermal properties.