Development of next generation drift FREE high vacuum gauges with lead FREE, stress FREE joining process

Research unit

INNOSUISSE

Project number

42449.1 IP-ENG

Project title

ThreeFree

Texts for this project

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Short description		-	-
Abstract		-	-	-

Category	Text
Short description (German)	ThreeFree
Short description (English)	Development of next generation drift FREE high vacuum gauges with lead FREE, stress FREE joining process
Abstract (German)	The goal is to develop drift free and stress free ceramic capacitance diaphragm gauges with lead free glass sealing and even better performance than today's state of the art for their core business customers in the semiconductor processing industries, in particular for dry etching processes.