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Forschungsstelle
INNOSUISSE
Projektnummer
44552.1 IP-ENG
Projekttitel
Technological protocol development for production of 3D structures in light sensitive polymers with Sub-Wavelength Holographic Lithography
Projekttitel Englisch
Technological protocol development for production of 3D structures in light sensitive polymers with Sub-Wavelength Holographic Lithography

Texte zu diesem Projekt
 DeutschFranzösischItalienischEnglisch
Kurzbeschreibung
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Abstract
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Erfasste Texte


KategorieText
Kurzbeschreibung
(Deutsch)
Technological protocol development for production of 3D structures in light sensitive polymers with Sub-Wavelength Holographic Lithography
Kurzbeschreibung
(Englisch)
Technological protocol development for production of 3D structures in light sensitive polymers with Sub-Wavelength Holographic Lithography
Abstract
(Deutsch)
Technology of Sub-Wavelength Holographic Lithographyhas (SWHL) has been developed and experimentally verified by Nanotech SWHL. For go-to-the market the technological protocols for 3D structures production in light sensitive polymers will be developed.