Platform for ultrafast amplified laser systems for high intensity applications at 2 micron wavelength

• Unité de recherche: INNOSUISSE
• Numéro de projet: 18625.1 PFNM-NM
• Titre du projet anglais: Platform for ultrafast amplified laser systems for high intensity applications at 2 micron wavelength

Description succincte (Allemand)

¿PLATWO¿ - Platform for ultrafast amplified laser systems for high intensity applications at 2 micron wavelength

Description succincte (Anglais)

Platform for ultrafast amplified laser systems for high intensity applications at 2 micron wavelength

Résumé des résultats (Abstract) (Allemand)

A novel ultrashort-pulse high-intensity laser source operating at 2 ìm will be developed for applications in the|fields of micromachining, medicine, metrology and spectroscopy. A novel concept based on the combination of|Raman-conversion of a well-developed 1.5-ìm low-noise ultrafast laser with fiber amplification and pulsepicking|stages will be developed to achieve state-of-the-art pulse energies in a spectral range where there is a|lack of commercial ultrafast systems.

Résumé des résultats (Abstract) (Anglais)

A novel ultrashort-pulse high-intensity laser source operating at 2 ìm will be developed for applications in the|fields of micromachining, medicine, metrology and spectroscopy. A novel concept based on the combination of|Raman-conversion of a well-developed 1.5-ìm low-noise ultrafast laser with fiber amplification and pulsepicking|stages will be developed to achieve state-of-the-art pulse energies in a spectral range where there is a|lack of commercial ultrafast systems.