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Unité de recherche
COST
Numéro de projet
C16.0075
Titre du projet
Oxide interface engineering for nanostructured devices
Titre du projet anglais
Oxide interface engineering for nanostructured devices

Textes relatifs à ce projet

 AllemandFrançaisItalienAnglais
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Textes saisis


CatégorieTexte
Mots-clé
(Anglais)
Functional oxide films; size-dependent phase stability; defect structure; electronic properties; environmental exposure
Programme de recherche
(Anglais)
COST-Action MP1407 - ELECTROCHEMICAL PROCESSING METHODOLOGIES AND CORROSION PROTECTION FOR DEVICE AND SYSTEMS MINIATURIZATION
Description succincte
(Anglais)
The project aims at fundamental understanding of the size- and interface-controlled phase stabilities, defect structures and electronic properties of TiOx and WOx films and TiOx/WOx nanostructures, as prepared from their metallic counterparts by different non-equilibrium and near-equilibrium oxidation methods. To this end, thin oxide films of TiOx and WOx (thicknesses from 3 to 20 nm) will be grown on Ti and W metal surfaces by electrochemical anodization and thermal oxidation methods. The phase stabilities, defect structures and electronic properties of the grown oxide films will be investigated as a function of the growth conditions, the post-annealing treatment, while accounting for the crucial roles of the growth conditions, the reacting interface structure and the oxide thickness on the developing oxide microstructure. Next respective TiOx/WOx nanostructures will be fabricated by controlled oxidation of Ti/W nanolayered structures (as grown by magnetron sputtering) using the previously optimized growth procedures for each growth method. The microstructure-property relationships and phase stability of the resutling TiOx/WOx heterostructures will be investigated before and after exposure to harsh environmental conditions by application of a broad range of analytical techniques. The research project aims at active collaborations within the COST MP1407 network for the dissemination and knowledge transfer of the electrochemical processing technology for device applications.
Autres indications
(Anglais)
Full name of research-institution/enterprise: EMPA - Swiss Federal Laboratories for Materials Science and Technology Research Scientist
Partenaires et organisations internationales
(Anglais)
AT; BE; BG; CZ; DK; FR; MK; DE, EL; HU; IE; IL; IT; LT; NO; PL; PT; RO: RS, SI; ES; SE; TR; UK
Résumé des résultats (Abstract)
(Anglais)
See short description
Références bases de données
(Anglais)
Swiss Database: COST-DB of the State Secretariat for Education and Research Hallwylstrasse 4 CH-3003 Berne, Switzerland Tel. +41 31 322 74 82 Swiss Project-Number: C16.0075