MURMELi: Multi-channel Ultra-Resolution Mask Exposure Lithography

• Research unit: INNOSUISSE
• Project number: 18188.1 PFNM-NM

Short description (German)

MURMELi: Multi-channel Ultra-Resolution Mask Exposure Lithography

Short description (English)

MURMELi: Multi-channel Ultra-Resolution Mask Exposure Lithography

Abstract (German)

Build and optimize 1X Microlens Projection Lithography (MPL) with more than 500um free working distance and 2um (half-pitch) minimum feature size. The development of next-generation Mask Aligners comprises illumination engineering for different sources (i-line, high power diode laser, Excimer), source-mask optimization (SMO) and high-resolution wafer positioning and combines the simplicity of Mask Aligners with the advantages of Steppers.

Abstract (English)