Room Temperature Aqueous Electrochemical Deposition of TiO2 thin films for implants coatings

• Unité de recherche: INNOSUISSE
• Numéro de projet: 13527.2;10 PFNM-NM
• Titre du projet anglais: Room Temperature Aqueous Electrochemical Deposition of TiO2 thin films for implants coatings

Description succincte (Allemand)

Room Temperature Aqueous Electrochemical Deposition of TiO2 thin films for implants coatings

Description succincte (Anglais)

Room Temperature Aqueous Electrochemical Deposition of TiO2 thin films for implants coatings

Résumé des résultats (Abstract) (Allemand)

The goal of this project is the development of a new process for electrolytic deposition of thin films of titania (TiO2), having macroscopically uniform thickness in the 20-100 nm range and stoichiometry and hence, uniform interference colour, on steel implants used for bone fracture fixations. The exact chemical composition (stoichiometry, trace elements) and the microstructure of the oxide will have a significant impact on biocompatibility and mechanical properties of the coatings. Process innovation includes for the first time plating on medical implants of the innovative layer.

Résumé des résultats (Abstract) (Anglais)

The goal of this project is the development of a new process for electrolytic deposition of thin films of titania (TiO2), having macroscopically uniform thickness in the 20-100 nm range and stoichiometry and hence, uniform interference colour, on steel implants used for bone fracture fixations. The exact chemical composition (stoichiometry, trace elements) and the microstructure of the oxide will have a significant impact on biocompatibility and mechanical properties of the coatings. Process innovation includes for the first time plating on medical implants of the innovative layer.