Feasibility study for the atmospheric plasma jet deposition of transparent conductive oxide for thin-film solar cell applications (JETCO)

• Unité de recherche: INNOSUISSE
• Numéro de projet: 12896.1;5 PFIW-IW
• Titre du projet anglais: Feasibility study for the atmospheric plasma jet deposition of transparent conductive oxide for thin-film solar cell applications (JETCO)

Description succincte (Anglais)

Feasibility study for the atmospheric plasma jet deposition of transparent conductive oxide for thin-film solar cell applications (JETCO)

Description succincte (Français)

Feasibility study for the atmospheric plasma jet deposition of transparent conductive oxide for thin-film solar cell applications (JETCO)

Résumé des résultats (Abstract) (Anglais)

In the framework of this project, we would like to investigate the possibility to use the atmospheric arc plasma jet technology developed by Swissnanocoat in order to deposit transparent conductive oxide films to be used as thin film silicon solar cells front electrodes. These films should be characterized by high transmission (above 85%), low resistivity (below 10-3 Ohm cm) and offer the possibility to achieve surface texturation for light scattering in the solar devices.

Résumé des résultats (Abstract) (Français)

In the framework of this project, we would like to investigate the possibility to use the atmospheric arc plasma jet technology developed by Swissnanocoat in order to deposit transparent conductive oxide films to be used as thin film silicon solar cells front electrodes. These films should be characterized by high transmission (above 85%), low resistivity (below 10-3 Ohm cm) and offer the possibility to achieve surface texturation for light scattering in the solar devices.