Black SU-8 photoresist optimizations for different microfabrication processes to a quick market delivery.

• Research unit: INNOSUISSE
• Project number: 13613.1;4 PFFLM-NM

Short description (English)

Black SU-8 photoresist optimizations for different microfabrication processes to a quick market delivery.

Short description (French)

Black SU-8 photoresist optimizations for different microfabrication processes to a quick market delivery.

Abstract (English)

Gersteltec and the Powder Technology Laboratory work have developed a black SU-8 photoresist during a CTI project. That product needs to be optimized for different techniques of microfabrication before its near commercialisation. A synergy between the black photoresists and the microfabrication techniques has to be investigated to propose in a short period a product to a technique of deposition and structuration. The objectives are to qualify the product for mass production and to make some recommendations of use for customers.

Abstract (French)

Gersteltec and the Powder Technology Laboratory work have developed a black SU-8 photoresist during a CTI project. That product needs to be optimized for different techniques of microfabrication before its near commercialisation. A synergy between the black photoresists and the microfabrication techniques has to be investigated to propose in a short period a product to a technique of deposition and structuration. The objectives are to qualify the product for mass production and to make some recommendations of use for customers.