Doping of active elements in thermal and chemical stability of PVD oxynitrides

• Research unit: INNOSUISSE
• Project number: 12235.1;14 PFNM-NM

Short description (English)

Doping of active elements in thermal and chemical stability of PVD oxynitrides

Short description (French)

Doping of active elements in thermal and chemical stability of PVD oxynitrides

Abstract (English)

This project aims at investigating the influence of minor addition of active elements such as yttrium on thermal and chemical stability of mixed main group metal/transition metal oxynitrides. Doping of bulk ceramics by isovalent and large size cations was found to have a pronounced influence on high temperature behaviour. Little is known on the consequences of active doping on growth mechanisms and overall properties of PVD coatings. This proposal is the last step in our research and development program in PVD oxynitrides, and it is to permit completion of the thermal barrier and low friction coatings project started during the CTI application N° 8873.2.

Abstract (French)

This project aims at investigating the influence of minor addition of active elements such as yttrium on thermal and chemical stability of mixed main group metal/transition metal oxynitrides. Doping of bulk ceramics by isovalent and large size cations was found to have a pronounced influence on high temperature behaviour. Little is known on the consequences of active doping on growth mechanisms and overall properties of PVD coatings. This proposal is the last step in our research and development program in PVD oxynitrides, and it is to permit completion of the thermal barrier and low friction coatings project started during the CTI application N° 8873.2.