Functional nanocomposites photoresist for Nano/Micro fabrication

• Unité de recherche: INNOSUISSE
• Numéro de projet: 11481.2;9 PFNM-NM
• Titre du projet anglais: Functional nanocomposites photoresist for Nano/Micro fabrication

Description succincte (Anglais)

Functional nanocomposites photoresist for Nano/Micro fabrication

Résumé des résultats (Abstract) (Anglais)

Gersteltec search to enlarge its product portfolio in developing new functional nanocomposite photoepoxy materials. These new products would allow to better design and manufacture Nano/microsystems. They are composite materials consisting of nanoparticles in epoxy matrices representing a novel class of materials for lithographic patterning with unique properties, arising from the synergism between the properties of both components. We will demonstrate the miscibility of epoxy resin surface-modified nanoparticles into epoxy photomaterial to create a patternable material with new properties, such as bio nanocomposites (nanoparticles Ceria de Evonik, hydroxihapatite) ferromagnetic, absorbant layer black CB (Evonik), ARC reduced refractive index for waveguiding applications (ZrO2, Tio2..). The lithographic, optical and mechanical properties of the nanocomposites-doped epoxy materials will be investigated depending on the nanosize composites contents in the photomaterial. The test processed will be evaluated by using UV lithography, UV-LIGA, E-beam lithography, Stencil and screen-printed.