Ultra thin solid etalon for wide tuning range

• Research unit: INNOSUISSE
• Project number: 9898.1;4 PFNM-NM

Short description (German)

Ultra thin solid etalon for wide tuning range

Short description (English)

Ultra thin solid etalon for wide tuning range

Abstract (German)

The main objective of the proposed project is the manufacturing and characterization of ultra thin high precision optical filters (solid etalons) made of SiO2. These etalons will enable the development of a novel generation of high precision tunable single-frequency solid-state lasers. The novel etalons will enable a highly enlarged wavelength tuning range as well as a simplified mechanical setup of the lasers. Since SiO2 is transparent at wavelengths from the visible to the infrared, these etalons will allow the project partners to develop an extremely versatile tunable laser platform which can be laid out both for telecom as well as non-telecom applications. The wavelength tuning range of the lasers will be extended by a factor of three ¿ a key enabler for new applications in telecommunication, like dispersion mapping and produc-tion line testing, or optical sensing. The scientific progress and highly innovative approach of the project lies in a better understanding of thermal transformation processes, micro structuring of SOI wafers and the deposition of low-stress dielectric reflecting layers on thin SiO2 beams. Most tasks represent a scien-tific advancement beyond the current state-of-the-art.

Abstract (English)

The main objective of the proposed project is the manufacturing and characterization of ultra thin high precision optical filters (solid etalons) made of SiO2. These etalons will enable the development of a novel generation of high precision tunable single-frequency solid-state lasers. The novel etalons will enable a highly enlarged wavelength tuning range as well as a simplified mechanical setup of the lasers. Since SiO2 is transparent at wavelengths from the visible to the infrared, these etalons will allow the project partners to develop an extremely versatile tunable laser platform which can be laid out both for telecom as well as non-telecom applications. The wavelength tuning range of the lasers will be extended by a factor of three ¿ a key enabler for new applications in telecommunication, like dispersion mapping and produc-tion line testing, or optical sensing. The scientific progress and highly innovative approach of the project lies in a better understanding of thermal transformation processes, micro structuring of SOI wafers and the deposition of low-stress dielectric reflecting layers on thin SiO2 beams. Most tasks represent a scien-tific advancement beyond the current state-of-the-art.