Thin film deposition in the new multilayer plasma process by means of a Triplex plasma torch

• Forschungsstelle: INNOSUISSE
• Projektnummer: 9397.2;4 PFIW-IW
• Projekttitel Englisch: Thin film deposition in the new multilayer plasma process by means of a Triplex plasma torch

Kurzbeschreibung (Deutsch)

Thin film deposition in the new multilayer plasma process by means of a Triplex plasma torch

Kurzbeschreibung (Englisch)

Thin film deposition in the new multilayer plasma process by means of a Triplex plasma torch

Abstract (Deutsch)

The plasma torch can be used to deposit thick (ìm to mm) and as recently shown also to deposit thin (nm to ìm) layers in a controlled atmosphere using flexible feedstock injection (liquid/gas/solid). The interesting high deposition rates of the thin film makes an extremely large variety of organic and inorganic thin and multi-layer coatings available to a large and interesting market. In the frame of the project, various applications shall be investigated and its implications on the equipment and safety of the device shall be clarified. These two parts of the project shall be essentially performed by the industrial partner. The scientifically oriented investigations of the physics and chemistry of the application of the plasma torch to thin film applications is attributed to the academic partner in this project.

Abstract (Englisch)

The plasma torch can be used to deposit thick (ìm to mm) and as recently shown also to deposit thin (nm to ìm) layers in a controlled atmosphere using flexible feedstock injection (liquid/gas/solid). The interesting high deposition rates of the thin film makes an extremely large variety of organic and inorganic thin and multi-layer coatings available to a large and interesting market. In the frame of the project, various applications shall be investigated and its implications on the equipment and safety of the device shall be clarified. These two parts of the project shall be essentially performed by the industrial partner. The scientifically oriented investigations of the physics and chemistry of the application of the plasma torch to thin film applications is attributed to the academic partner in this project.