Engineering of Thin Film Crystallinity for Wear Resistant Coatings Utilizing a Combination of PECVD and PVD Plasma Technology

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Projektnummer

8759.3;5 PFIW-IW

Projekttitel

Engineering of Thin Film Crystallinity for Wear Resistant Coatings Utilizing a Combination of PECVD and PVD Plasma Technology

Projekttitel Englisch

Engineering of Thin Film Crystallinity for Wear Resistant Coatings Utilizing a Combination of PECVD and PVD Plasma Technology

Texte zu diesem Projekt

	Deutsch	Französisch	Italienisch	Englisch
Kurzbeschreibung	-	-	-
Abstract	-	-	-

Erfasste Texte

Kategorie	Text
Kurzbeschreibung (Englisch)	Engineering of Thin Film Crystallinity for Wear Resistant Coatings Utilizing a Combination of PECVD and PVD Plasma Technology
Abstract (Englisch)	Wear resistant coatings cover a wide range of industrial applications and are well accepted to increase tool life and productivity in cutting tool applications. The market for these layers showed continuous growth over the last two decades. For coatings in the µm-range, Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD) are best suited deposition technologies. While CVD needs high substrate temperatures for gas dissociation and growth, PVD has the advantage to form nitrides and oxides at relatively low temperatures and allows therefore a wider selection of tool materials. However, it is challenging to obtain defined crystalline structures of the coatings deposited by PVD. In contrast to CVD, the layer condensation and compound formation processes are more difficult to control. This is a disadvantage of PVD, especially for tool applications for which the crystalline structure of the layer is essential. The most prominent example for this is g-alumina (corundum) which has outstanding properties for hardness and chemical stability at high cutting tool temperatures. Until now, PVD has not succeeded yet to achieve oxide layers with this structure and quality. In this project, a new PVD approach is investigated to form corundum-type crystalline alumina-based structures at temperatures below 600°C. This approach will open new markets in coating business for turning and milling applications, for difficult-to-machine materials, and will replace CVD g-alumina in segments for which higher fracture toughness is necessary.

Kategorie

Text

Kurzbeschreibung
(Englisch)

Engineering of Thin Film Crystallinity for Wear Resistant Coatings Utilizing a Combination of PECVD and PVD Plasma Technology

Abstract
(Englisch)

Wear resistant coatings cover a wide range of industrial applications and are well accepted to increase tool life and productivity in cutting tool applications. The market for these layers showed continuous growth over the last two decades. For coatings in the µm-range, Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD) are best suited deposition technologies. While CVD needs high substrate temperatures for gas dissociation and growth, PVD has the advantage to form nitrides and oxides at relatively low temperatures and allows therefore a wider selection of tool materials. However, it is challenging to obtain defined crystalline structures of the coatings deposited by PVD. In contrast to CVD, the layer condensation and compound formation processes are more difficult to control. This is a disadvantage of PVD, especially for tool applications for which the crystalline structure of the layer is essential. The most prominent example for this is g-alumina (corundum) which has outstanding properties for hardness and chemical stability at high cutting tool temperatures. Until now, PVD has not succeeded yet to achieve oxide layers with this structure and quality. In this project, a new PVD approach is investigated to form corundum-type crystalline alumina-based structures at temperatures below 600°C. This approach will open new markets in coating business for turning and milling applications, for difficult-to-machine materials, and will replace CVD g-alumina in segments for which higher fracture toughness is necessary.