Advanced Laser Beam Shaping (ALBS)

Fonte Standard Gras
Identifiant

Unité de recherche

INNOSUISSE

Numéro de projet

9143.2;3 PFNM-NM

Titre du projet

Advanced Laser Beam Shaping (ALBS)

Titre du projet anglais

Advanced Laser Beam Shaping (ALBS)

Textes relatifs à ce projet

	Allemand	Français	Italien	Anglais
Description succincte	-	-	-
Résumé des résultats (Abstract)	-	-	-

Textes saisis

Catégorie	Texte
Description succincte (Anglais)	Advanced Laser Beam Shaping (ALBS)
Résumé des résultats (Abstract) (Anglais)	Applications like laser ablation, annealing, lithography, skin treatment, scanning, bio-sensing, digital light projection, etc. require a very homogeneous illumination, e.g. a long line or larger surface area. Microlens based homogenizers and diffractive light shapers are well suited for this purpose. However, diffraction effects, interference and speckles limit the illumination uniformity. The remaining intensity variations limit the quality of a process or system and are often unacceptable. This proposal aims at this industrial demand and will provide industry with linear static and dynamic random diffusers, which will create completely homogeneous intensity profiles. While static random diffusers can be used for high power lasers, the dynamic random diffusers are tunable and allow angular and intensity profile adjustment at medium power levels. The partners will utilize wafer-level microtechnology that allows such a precise definition of the novel microoptical structures.

Catégorie

Texte

Description succincte
(Anglais)

Advanced Laser Beam Shaping (ALBS)

Résumé des résultats (Abstract)
(Anglais)

Applications like laser ablation, annealing, lithography, skin treatment, scanning, bio-sensing, digital light projection, etc. require a very homogeneous illumination, e.g. a long line or larger surface area. Microlens based homogenizers and diffractive light shapers are well suited for this purpose. However, diffraction effects, interference and speckles limit the illumination uniformity. The remaining intensity variations limit the quality of a process or system and are often unacceptable. This proposal aims at this industrial demand and will provide industry with linear static and dynamic random diffusers, which will create completely homogeneous intensity profiles. While static random diffusers can be used for high power lasers, the dynamic random diffusers are tunable and allow angular and intensity profile adjustment at medium power levels. The partners will utilize wafer-level microtechnology that allows such a precise definition of the novel microoptical structures.