Advanced Laser Beam Shaping (ALBS)

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Research unit

INNOSUISSE

Project number

9143.2;3 PFNM-NM

Project title

Advanced Laser Beam Shaping (ALBS)

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Short description	-	-	-
Abstract	-	-	-

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Short description (English)	Advanced Laser Beam Shaping (ALBS)
Abstract (English)	Applications like laser ablation, annealing, lithography, skin treatment, scanning, bio-sensing, digital light projection, etc. require a very homogeneous illumination, e.g. a long line or larger surface area. Microlens based homogenizers and diffractive light shapers are well suited for this purpose. However, diffraction effects, interference and speckles limit the illumination uniformity. The remaining intensity variations limit the quality of a process or system and are often unacceptable. This proposal aims at this industrial demand and will provide industry with linear static and dynamic random diffusers, which will create completely homogeneous intensity profiles. While static random diffusers can be used for high power lasers, the dynamic random diffusers are tunable and allow angular and intensity profile adjustment at medium power levels. The partners will utilize wafer-level microtechnology that allows such a precise definition of the novel microoptical structures.

Category

Text

Short description
(English)

Advanced Laser Beam Shaping (ALBS)

Abstract
(English)

Applications like laser ablation, annealing, lithography, skin treatment, scanning, bio-sensing, digital light projection, etc. require a very homogeneous illumination, e.g. a long line or larger surface area. Microlens based homogenizers and diffractive light shapers are well suited for this purpose. However, diffraction effects, interference and speckles limit the illumination uniformity. The remaining intensity variations limit the quality of a process or system and are often unacceptable. This proposal aims at this industrial demand and will provide industry with linear static and dynamic random diffusers, which will create completely homogeneous intensity profiles. While static random diffusers can be used for high power lasers, the dynamic random diffusers are tunable and allow angular and intensity profile adjustment at medium power levels. The partners will utilize wafer-level microtechnology that allows such a precise definition of the novel microoptical structures.