Advanced Laser Beam Shaping (ALBS)

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Forschungsstelle

INNOSUISSE

Projektnummer

9143.2;3 PFNM-NM

Projekttitel

Advanced Laser Beam Shaping (ALBS)

Projekttitel Englisch

Advanced Laser Beam Shaping (ALBS)

Texte zu diesem Projekt

	Deutsch	Französisch	Italienisch	Englisch
Kurzbeschreibung	-	-	-
Abstract	-	-	-

Erfasste Texte

Kategorie	Text
Kurzbeschreibung (Englisch)	Advanced Laser Beam Shaping (ALBS)
Abstract (Englisch)	Applications like laser ablation, annealing, lithography, skin treatment, scanning, bio-sensing, digital light projection, etc. require a very homogeneous illumination, e.g. a long line or larger surface area. Microlens based homogenizers and diffractive light shapers are well suited for this purpose. However, diffraction effects, interference and speckles limit the illumination uniformity. The remaining intensity variations limit the quality of a process or system and are often unacceptable. This proposal aims at this industrial demand and will provide industry with linear static and dynamic random diffusers, which will create completely homogeneous intensity profiles. While static random diffusers can be used for high power lasers, the dynamic random diffusers are tunable and allow angular and intensity profile adjustment at medium power levels. The partners will utilize wafer-level microtechnology that allows such a precise definition of the novel microoptical structures.

Kategorie

Text

Kurzbeschreibung
(Englisch)

Advanced Laser Beam Shaping (ALBS)

Abstract
(Englisch)

Applications like laser ablation, annealing, lithography, skin treatment, scanning, bio-sensing, digital light projection, etc. require a very homogeneous illumination, e.g. a long line or larger surface area. Microlens based homogenizers and diffractive light shapers are well suited for this purpose. However, diffraction effects, interference and speckles limit the illumination uniformity. The remaining intensity variations limit the quality of a process or system and are often unacceptable. This proposal aims at this industrial demand and will provide industry with linear static and dynamic random diffusers, which will create completely homogeneous intensity profiles. While static random diffusers can be used for high power lasers, the dynamic random diffusers are tunable and allow angular and intensity profile adjustment at medium power levels. The partners will utilize wafer-level microtechnology that allows such a precise definition of the novel microoptical structures.