From conventional Plasma Spraying to Reactive Thermal Plasma CVD

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Identifiant

Unité de recherche

INNOSUISSE

Numéro de projet

7397.1;7 EPRP-IW

Titre du projet

From conventional Plasma Spraying to Reactive Thermal Plasma CVD

Textes relatifs à ce projet

	Allemand	Français	Italien	Anglais
Description succincte		-	-	-
Résumé des résultats (Abstract)		-	-	-

Textes saisis

Catégorie	Texte
Description succincte (Allemand)	From conventional Plasma Spraying to Reactive Thermal Plasma CVD
Résumé des résultats (Abstract) (Allemand)	The plasma torch is one of the most elemental plasma source used in industrial applications. Recently a new processes based on elements from the plasma spray technology has been invented by Sulzer Metco in order to open new unexplored markets for advance surface treatment. The main aims of the present project is to open the plasma spray processing also for liquid and gaseous precursors by adapting the plasma torch operation parameters to the precursors and plasma chemistry aimed for the coatings with the desired material properties. The investigations shall be made by a case study in Carbon. Carbon is interesting so far as well from the side of possible precursors as well as of potential applications.

Catégorie

Texte

Description succincte
(Allemand)

From conventional Plasma Spraying to Reactive Thermal Plasma CVD

Résumé des résultats (Abstract)
(Allemand)

The plasma torch is one of the most elemental plasma source used in industrial applications. Recently a new processes based on elements from the plasma spray technology has been invented by Sulzer Metco in order to open new unexplored markets for advance surface treatment. The main aims of the present project is to open the plasma spray processing also for liquid and gaseous precursors by adapting the plasma torch operation parameters to the precursors and plasma chemistry aimed for the coatings with the desired material properties. The investigations shall be made by a case study in Carbon. Carbon is interesting so far as well from the side of possible precursors as well as of potential applications.