Feasibility study: Direct deposition of high-performance chemical sensing layers on CMOS-based sensors

• Unité de recherche: INNOSUISSE
• Numéro de projet: 7745.1;4 NMPP-NM
• Titre du projet anglais: Feasibility study: Direct deposition of high-performance chemical sensing layers on CMOS-based sensors

Description succincte (Anglais)

Feasibility study: Direct deposition of high-performance chemical sensing layers on CMOS-based sensors

Résumé des résultats (Abstract) (Anglais)

Motivation for this project is the commercial need for a high-performance product based on a fully integrated CMOS-based chemical sensor featuring a directly-deposited metal-oxide sensitive layer.The project brings together the leading competences of the three partners, ETH Particle Technology Laboratory (PTL), ETH Physical Electronics Laboratory (PEL) and Sensirion AG in order to create the basis and the knowledge for the development of the next generation of metal-oxide based microsensors. CMOS-based chemical sensors developed by PEL have been demonstrated as high-performance devices with considerable advantages beyond the state-of-the-art. Direct-deposition of flame-made nanoparticles, a technique developed by PTL, has been demonstrated as an ideal technique to assemble high-performance sensitive layers for chemical gas sensors. This project seeks to combine these technologies to realize a superior commercial sensing device. Scientific objectives are focused on the nature of the sensing layer with the overall objective being to develop strategies for achieving optimal sensing layer adhesion, with sufficient feature resolution, while maintaining high overall chemical sensing performance.