Ion Assisted Sputter Deposition of high precision multilayer coatings for UV optics

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INNOSUISSE

Projektnummer

7336.1;7 EPRP-IW

Projekttitel

Ion Assisted Sputter Deposition of high precision multilayer coatings for UV optics

Projekttitel Englisch

Ion Assisted Sputter Deposition of high precision multilayer coatings for UV optics

Texte zu diesem Projekt

	Deutsch	Französisch	Italienisch	Englisch
Kurzbeschreibung	-	-	-
Abstract	-	-	-

Erfasste Texte

Kategorie	Text
Kurzbeschreibung (Englisch)	Ion Assisted Sputter Deposition of high precision multilayer coatings for UV optics
Abstract (Englisch)	In a close collaboration with Unaxis Optics, the novel (patented) Optima coating process ¿ an ion assisted sputter deposition process ¿ is adapted for the production of precise multilayer coatings for UV optics and EUV 3.4nm) mirror applications. The production of such multilayer stacks requires a rigorous process control, concerning layer thickness uniformity, interface roughness, process stability as well as reproducibility. The fabrication and optimization process of UV and EUV coatings goes along with characterization steps, involving various analytics like HR-TEM, AFM, X-ray analytics, RBS as well as UV and EUV reflection measurements and tests of laser induced damage.

Kategorie

Text

Kurzbeschreibung
(Englisch)

Ion Assisted Sputter Deposition of high precision multilayer coatings for UV optics

Abstract
(Englisch)

In a close collaboration with Unaxis Optics, the novel (patented) Optima coating process ¿ an ion assisted sputter deposition process ¿ is adapted for the production of precise multilayer coatings for UV optics and EUV 3.4nm) mirror applications. The production of such multilayer stacks requires a rigorous process control, concerning layer thickness uniformity, interface roughness, process stability as well as reproducibility. The fabrication and optimization process of UV and EUV coatings goes along with characterization steps, involving various analytics like HR-TEM, AFM, X-ray analytics, RBS as well as UV and EUV reflection measurements and tests of laser induced damage.