Performance Improvement of Novel LIGA resist Using different techniques

• Research unit: INNOSUISSE
• Project number: 6959.2;7 EPRP-IW

Short description (German)

Performance Improvement of Novel LIGA resist Using different techniques

Short description (English)

Performance Improvement of Novel LIGA resist Using different techniques

Abstract (English)

The company DONIAR SA is active in the field of creating small precision components in the field of electroplating using LIGA Technique. The most important photoresist that is on the market is called SU-8 initially developed by IBM. The resists gives excellent results but has enormous problems to be stripped away after processing the samples. An alternative resist was developed by the company High Tech Polymere AG (HTP) in collaboration with CSEM that has excellent stripping properties but delivers the same results as yet. Within the submitted project, a team that consists EIAJ, CSEM, NTB, HTP and Doniar SA will study the properties of the new resist with respect of UV, ion beam, X-ray SLS (Swiss light source) and Laser LIGA. The result will help the industrial partners either to increase the quality of the products and to go to smaller feature-sizes such that allow to meet other business sectors (for Doniar SA), or to better commercialise the new resist (for HTP AG).